Electrical conductor and a production method therefor

ABSTRACT

Provided are an electrical conductor and a production method therefor; the electrical conductor comprising a transparent substrate and an electro-conductive pattern provided on at least one surface of the transparent substrate, and the electroconductive pattern being of a type such that, for at least 30% of the entire surface area of the transparent substrate, when a straight line is drawn intersecting the electroconductive pattern, the ratio of the standard deviation to the mean value of the distances between adjacent points of intersection between the straight line and the electroconductive pattern (the distance distribution ratio) is at least 2%. Also, provided are an electrical conductor and a production method therefor; the electrical conductor comprising a transparent substrate and an electroconductive pattern provided on at least one surface of the transparent substrate, and the electroconductive pattern being of a type such that at least 30% of the entire surface area of the transparent substrate is accounted for by continuously distributed closed motifs, and the ratio of the standard deviation to the mean value of the surface areas of the closed motifs (the surface area distribution ratio) is at least 2%.

This application is a Continuation of U.S. patent application Ser. No.13/384,096, filed on Jan. 13, 2012, which is the national stageapplication of PCT/KR2010/004675, filed Jul. 16, 2010, which claimspriority to Korean Patent Application Nos. 10-2009-0065103, filed onJul. 16, 2009, 10-2009-0065106, filed on Jul. 16, 2009, and10-2010-0069157, filed on Jul. 16, 2010, all of which are incorporatedherein by reference in their entirety.

TECHNICAL FIELD

The present invention relates to an electrical conductor and aproduction method therefor.

The present application claims priority to Korean Patent ApplicationNos. 10-2009-0065103 and 10-2009-0065106 filed on Jul. 16, 2009 andKorean Patent Application No. 10-2010-0069157 filed on Jul. 16, 2010,the entire contents of which application is incorporated herein for allpurposes by this reference.

BACKGROUND OF THE INVENTION

In general, a display device is monitors for TV or computers, andincludes a display diode that forms an image and a case that supportsthe display diode.

As a display diode, there may be exemplified by plasma display panel(PDP), liquid crystal display (LCD), electrophoretic display andcathode-ray tube (CRT). In a display diode, an RGB pixel pattern andadditional optical filter for implementing an image may be provided.

An optical filter may include at least one of an anti-reflective filmthat prevents the reflection of the light that is incident from anoutside to the outside, a near IR shield film that shields near infraredlight that is generated in a display diode in order to prevent thedisoperation of electronic devices such as remote controllers and thelike, a color correction film that includes a color control dye andincreases a color purity by controlling a color tone, and anelectromagnetic wave shield film that shields an electromagnetic wavethat is generated in a display diode when a display device is driven. Anelectromagnetic wave shield film includes a transparent substrate and ametal mesh pattern that is provided on the substrate.

Recently, according to the rapid spreading of IPTVs, a demand for touchfunction that a direct input device uses without a separate input devicesuch as remote controllers has been increased. In addition, a functionfor specific point recognition and multi-touch function that can performwriting are required.

A touch panel may be classified into a resistive type touch panel, acapacitive type touch panel and an electromagnetic type touch panel. Aresistive type touch panel detects the position that is pressed by apressure by detecting a change in current or voltage value, in responseto the application of a direct voltage. A capacitive type touch paneluses a capacitance coupling in a state where an alternating voltage isapplied. An electromagnetic type touch panel detects the selectedposition by a change in voltage in a state where a magnetic field isapplied.

Among them, the resistive type and capacitive type touch panelsrecognize the touch by a change in electric contact or capacitance byusing a transparent conductive film such as the ITO film. However, sincea transparent conductive film has the high resistance of 100 ohms/squareor more, the sensitivity is lowered when it is manufactured in a largescale. Further, a high cost of ITO film makes the commercialization of alarge-scale screen. In order to reduce a manufacturing cost, there is aneffort to adopt a metal pattern on a touch panel.

When a display device includes an electromagnetic wave shield film or atouch panel that includes a metal pattern, a Moire phenomenon may becaused by the interference between the metal pattern and a pixel patternof the display, electrode pattern or pattern structure of the otheroptical film. Here, the Moire phenomenon means an interference fringegenerated when two or more regular patterns overlap.

In a plasma display panel (PDP), since a pixel pattern of the plasmadisplay panel (PDP) and a metal mesh pattern for electromagnetic waveshielding of an optical filter coexist, a Moire phenomenon may occur.Therefore, in general, if a specification of the plasma display panel(PDP) is determined, an effort for solving the Moire phenomenon isrequired.

In order to remove a Moire phenomenon, the line width and pitch andangle of the metal mesh pattern for the electromagnetic wave shieldingare controlled, but there is a problem in that it should correspond todifferent patterns according to the size and the pixel implementationmethod of the display device.

A plasma display panel that is currently developed, in order toimplement high resolution, includes a more precise pixel pattern, suchthat the occurrence possibility of a Moire phenomenon is increased.Accordingly, there is a limit in improvement of the Moire phenomenon byusing only the line width, pitch, and angle of the known pattern.

Disclosure

The present invention provides an electrical conductor that has apattern that does not obstruct the field of vision, has excellentconductivity, and prevents a Moire phenomenon, and a method formanufacturing the same.

An embodiment of the present invention provides an electrical conductorthat includes a transparent substrate; and an electric conductivepattern that is provided on at least one side of the transparentsubstrate, wherein 30% or more of the entire area of the transparentsubstrate has the electric conductive pattern in which a ratio (distancedistribution ratio) of standard deviation in respects to an averagevalue of distances between adjacent intersection points of the straightline and the electric conductive pattern is 2% or more when the straightline that crosses the electric conductive pattern is drawn. It ispreferable that the straight line that crosses the electric conductivepattern is a line in which the closest distance deviation of theintersection points with the electric conductive pattern is small. Inaddition, it may be a line that vertically extends in respects to thetangent line of any one point of the electric conductive pattern.

Another embodiment of the present invention provides a method formanufacturing an electrical conductor that includes forming an electricconductive pattern on a transparent substrate, wherein 30% or more ofthe entire area of the transparent substrate has the electric conductivepattern in which a ratio (distance distribution ratio) of standarddeviation in respects to an average value of distances between adjacentintersection points of the straight line and the electric conductivepattern is 2% or more when the straight line that crosses the electricconductive pattern is drawn. The electric conductive pattern may beformed by using a printing method, a photolithography method, aphotography method, a method using a mask, a sputtering method, or aninkjet method.

Still another embodiment of the present invention provides an electricalconductor that includes a transparent substrate; and an electricconductive pattern that is provided on at least one side of thetransparent substrate, wherein 30% or more of the entire area of thetransparent substrate is formed of closed figures in which distributionsare continuous, and the electrical conductor has the electric conductivepattern in which a ratio (distance distribution ratio) of standarddeviation in respects to an average value of areas of the closed figuresis 2% or more.

Yet another embodiment of the present invention provides a method formanufacturing an electrical conductor, which includes forming anelectric conductive pattern on a transparent substrate, wherein 30% ormore of the entire area of the transparent substrate is formed of closedfigures in which distributions are continuous, and the electricalconductor has the electric conductive pattern in which a ratio (distancedistribution ratio) of standard deviation in respects to an averagevalue of areas of the closed figures is 2% or more. The electricconductive pattern may be formed by using a printing method, aphotolithography method, a photography method, a method using a mask, asputtering method, or an inkjet method.

Still yet another embodiment of the present invention provides anelectromagnetic wave shield film that includes an electrical conductor,a touch panel, a display, and organic light emitting diode (OLED)lighting.

Advantageous Effects

According to the embodiments of the present invention, the electricalconductor may not obstruct the field of vision, have excellentconductivity, and prevent a Moire phenomenon. In addition, since theelectrical conductor according to the present invention can be formed byusing various methods such as using a printing method, aphotolithography method, a photography method, a method using a mask, asputtering method, or an inkjet method after a desired pattern ispreviously set, the process is easily performed and the cost is low.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 and FIG. 2 illustrate a state in which a predetermined straightline is drawn on an electric conductive pattern of an electricalconductor according to an embodiment of the present invention;

FIG. 3 illustrates the electric conductive pattern of the electricalconductor according to an embodiment of the present invention;

FIG. 4 is a view that illustrates an offset printing process;

FIG. 5 illustrates forming the pattern by using the Voronoi diagramgenerator according to an embodiment of the present invention;

FIG. 6 illustrates the electric conductive pattern of the electricalconductor according to the present invention;

FIGS. 7 to 9 illustrate the electric conductive pattern of theelectrical conductor according to the present invention;

FIG. 10 illustrates forming the pattern by using the Delaunay patterngenerator according to an embodiment of the present invention;

FIGS. 11 to 13 illustrate the electric conductive pattern of theelectrical conductor according to the present invention;

FIG. 14 illustrates the arrangement of the Delaunay pattern generatoraccording to an embodiment of the present invention;

FIG. 15 and FIG. 16 illustrate the electric conductive pattern of theelectrical conductor according to the related art;

FIG. 17 illustrates the measurement results of the surface resistancevalue according to the position of the electrical conductor by using theelectric conductive pattern according to an embodiment of the presentinvention;

FIG. 18 illustrates the measurement results of the surface resistancevalue according to the position of the electrical conductor by using theelectric conductive pattern according to an embodiment of the presentinvention;

FIG. 19 is an example that compares the occurrence of Moire phenomenonfor each angle after the electrical conductor that includes the electricconductive pattern according to an embodiment of the present inventionand a known PDP filter overlap at the distance of 5 cm from the 42″(inch) PDP;

FIG. 20 is an example that compares the occurrence of Moire phenomenonfor each angle after the electrical conductor that includes the electricconductive pattern according to an embodiment of the present inventionand a known PDP filter overlap at the distance of 5 cm from the 42″(inch) PDP;

FIG. 21 illustrates the measurement results of the electromagnetic waveshield (EMI) performance in the range of frequency of 30 to 1000 MHzwhen the electrical conductor that includes the electric conductivepattern is used as the electromagnetic wave shield (EMI) filter of PDP;

FIG. 22 illustrates the structure of the touch screen that includes theelectric conductive pattern according to an embodiment of the presentinvention;

FIG. 23 illustrates the comparison of the result of linearity evaluationthat shows the precision of the touch screen with the result of thetouch screen that has a known transparent conductive substrate (ITO);

FIG. 24 illustrates pictures before and after the blackening treatmentof the electrical conductor that is manufactured in the embodiment;

FIG. 25 and FIG. 26 illustrate the structure of the auxiliary electrodefor organic light emitting diode lighting according to an embodiment ofthe present invention; and

FIG. 27 illustrates a Moire phenomenon according to the line width andpitch.

DETAILED DESCRIPTION OF THE EMBODIMENTS

Hereinafter, the present invention will be described in more detail.

An electrical conductor according to an exemplary embodiment of thepresent invention is an electrical conductor that includes a transparentsubstrate and an electric conductive pattern that is provided on atleast one side of the transparent substrate, wherein 30% or more of theentire area of the transparent substrate has the electric conductivepattern. When the straight line that crosses the electric conductivepattern is drawn, a ratio (distance distribution ratio) of standarddeviation in respect to an average value of distances between adjacentintersection points of the straight line and the electric conductivepattern is 2% or more.

In addition, an electrical conductor according to another exemplaryembodiment of the present invention includes a transparent substrate andan electric conductive pattern that is provided on at least one side ofthe transparent substrate, wherein 30% or more of the entire area of thetransparent substrate is formed of closed figures in which distributionsare continuous. The electrical conductor has the electric conductivepattern in which a ratio (area distribution ratio) of standard deviationin respect to an average value of areas of the closed figures is 2% ormore.

As in the related art, in the case where the transparent conductivelayer is formed on the entire area, there is a problem in thatresistance is very high. In addition, in the case where the electricconductive pattern that is formed of one or more kind of regular patternis included in a regular internal structure, a relative interferencebetween the patterns occurs by the light source that is adjacent to thepattern structures, such that a Moire phenomenon occurs. The regularpattern may be a pattern using the grid method or linear method. Forexample, the regular internal structure may be a display that has apixel structure, an optical film that has a regular pattern structure ora display that includes an electrode structure. If the Moire phenomenonoccurs, visual recognition ability (visibility) is lowered. Therefore,in order to solve this, in the exemplary embodiment of the presentinvention, in consideration that the regularity of the pattern causesthe Moire phenomenon, it is possible to prevent the occurrence of theMoire phenomenon by making the pattern irregular.

In the exemplary embodiment of the present invention, as describedabove, when 30% or more, specifically 70% or more, and more specifically90% or more of the entire area of the transparent substrate has theelectric conductive pattern in which a ratio (distance distributionratio) of standard deviation is 2% or more when the straight line thatcrosses the electric conductive pattern is drawn. It is possible toprovide the electrical conductor that may prevent the Moire phenomenon,and may satisfy excellent electric conductivity and optical properties.Here, the ratio (distance distribution ratio) of standard deviationmeans a ratio of standard deviation in respect to an average value ofdistances between adjacent intersection points of the straight line andthe electric conductive pattern.

In the exemplary embodiment of the present invention, the straight linethat crosses the electric conductive pattern may be a line in which thestandard deviation of the distances between adjacent intersection pointsof the straight line and the electric conductive pattern has thesmallest value. In addition, the straight line that crosses the electricconductive pattern may be a straight line that vertically extends inrespect to the tangent line of any one point of the electric conductivepattern.

In the electrical conductor according to the exemplary embodiment of thepresent invention, the straight line that crosses the electricconductive pattern may have 80 intersection points with the electricconductive pattern.

The ratio (distance distribution ratio) of standard deviation in respectto an average value of distances between adjacent intersection points ofthe straight line that crosses the electric conductive pattern and theelectric conductive pattern may be 2% or more, more specifically 10% ormore, and even more specifically 20% or more.

The pattern in which the ratio (distance distribution ratio) of standarddeviation in respect to an average value of distances between adjacentintersection points of the straight line that crosses the electricconductive pattern and the electric conductive pattern is 2% or more maybe 30% or more of the entire area of the transparent substrate. Anothertype of electric conductive pattern may be provided on at least aportion of the surface of the transparent substrate that is providedwith the electric conductive pattern described above.

In the electrical conductor according to the exemplary embodiment of thepresent invention, the number of the closed figures may be at least 100.

The ratio (area distribution ratio) of standard deviation in respect toan average value of areas of the closed figures is specifically 2% ormore, more specifically 10% or more, and even more specifically 20% ormore.

The pattern that is formed of the closed figures in which the ratio(area distribution ratio) of standard deviation in respect to an averagevalue of areas thereof is 2% or more may be 30% or more in respect tothe entire area of the transparent substrate. Another type of electricconductive pattern may be provided on at least a portion of the surfaceof the transparent substrate that is provided with the electricconductive pattern described above.

After the electrical conductor according to the exemplary embodiment ofthe present invention is disposed at the distance of 5 cm or less fromthe device that has the regular pattern, like the pixel pattern or colorfilter pattern, for example, the display, when the device is observed atan angle of 0 to 80° in respect to the line that is vertical to thetransparent substrate, the interference pattern by the Moire phenomenonis not observed.

In addition, after the electrical conductor according to the exemplaryembodiment of the present invention is used as the electromagnetic waveshield (EMI) film to manufacture the 42-inch PDP, in order to measure anelectromagnetic wave shield (EMI) ability level, the frequency of thearea band between the 30 MHz and 1000 MHz is measured at the intervaldistance of 3 m. As a result, the electromagnetic wave shield (EMI)ability that has the Class B level or more is confirmed. In this case,when the PDP is observed at an angle of 0 to 80° in respect to the linethat is vertical to the transparent substrate, the interference patternby the Moire phenomenon is not observed.

In addition, after the touch screen of 40-inch projected capacitancetype is manufactured by using the electrical conductor according to theexemplary embodiment of the present invention, the linearity evaluationis performed to evaluate the precision of the touch screen. As a result,it is possible to implement the touch screen that has higher precisionas compared to the known ITO-based touch screen. In this case, when thetouch screen is observed at an angle of 0 to 80° in respect to the linethat is vertical to the touch screen, the interference pattern by theMoire phenomenon is not observed.

Meanwhile, in the case where the patterns are completely irregular, inthe distribution of the line, there may be a difference between a looseportion and a dense portion thereof. In the distribution of the line,although the line width may be thin, a problem of visual recognition mayoccur. In this case, a condition that is required for the purpose of theelectrical conductor may not be satisfied.

For example, in the case where the electrical conductor is used for anelectromagnetic wave shield, if the pattern is completely irregular andthe interval between some patterns are very wide, the electromagneticwave can pass through the patterns that have the wide interval, suchthat defects may occur.

In addition, in the case where the electrical conductor is used for atouch panel, if the loose portion and the dense portion of the patternare formed, resistance or capacitance becomes irregular, such that thetouched position may be wrongly recognized.

In order to solve this problem, in the exemplary embodiment of thepresent invention, when the electric conductive pattern is formed,regularity and irregularity may be appropriately harmonized. Forexample, the basic unit is set so that the electric conductive patternis observed or the local conductivity is not generated, and the electricconductive pattern may be irregularly formed in the basic unit. If theabove method is used, the visuality is compensated and the specificationfor the purpose of the products can be satisfied by preventing thelocalization of the distribution of the electric conductive pattern onany one point.

As described above, for uniform electric conductivity and visuality ofthe electrical conductor, the opening ratio of the pattern may beconstant in the unit area. The permeability deviation of the electricalconductor may be 5% or less in respect to a predetermined circle thathas the diameter of 20 cm. In this case, the electrical conductor mayprevent the local conductivity.

In the exemplary embodiment of the present invention, the electricconductive pattern may be formed of straight lines, or variousmodifications such as curved lines, wave lines, and zigzag lines may befeasible. In addition, at least two of the above lines may be mixed witheach other.

FIGS. 1 and 2 illustrate a state in which a predetermined line is drawnon an electric conductive pattern according to an exemplary embodimentof the present invention. However, the scope of the present invention isnot limited thereto. FIG. 1 illustrates a one-dimensional state in whichthe electric conductive patterns do not cross each other, and FIG. 2illustrates a two-dimensional state in which the electric conductivepatterns cross each other and a form of a closed figure is formed onsome areas. An example of another electric conductive pattern isillustrated in FIG. 6, but the scope of the present invention is notlimited thereto.

FIG. 3 illustrates the electric conductive pattern according to theembodiment of the present invention. The area distribution ratio of thepattern is 20% or more, for example, 20 to 35%.

According to an embodiment of the present invention, the electricconductive pattern may be a boundary shape of the figures that form aVoronoi diagram.

In the exemplary embodiment of the present invention, the Moirephenomenon may be prevented by forming the electric conductive patternin a boundary form of the figures that form the Voronoi diagram.

The Voronoi diagram is a pattern that is formed by filling the closestarea to the corresponding dot as compared to the distance of each dotfrom other dots if Voronoi diagram generator dots are disposed in adesired area to be filled. For example, when large discount stores inthe whole country are represented by dots and consumers find the closestlarge discount store, the pattern that displays the commercial area ofeach discount store may be exemplified. That is, if a space is filledwith a regular hexagon and each dot of the regular hexagon is selectedby the Voronoi generator, the electric conductive pattern may be ahoneycomb structure.

In the exemplary embodiment of the present invention, in the case wherethe electric conductive pattern is formed by using the Voronoi diagramgenerator, there is a merit in that a complex pattern form that canprevent the Moire phenomenon that may be generated by an interferencewith another regular pattern may be easily determined. FIG. 3illustrates the forming of the pattern using the Voronoi diagramgenerator. An example of the conductive pattern is illustrated in FIGS.7 to 9, but the scope of the present invention is not limited thereto.

In the exemplary embodiment of the present invention, the pattern thatis derived from the generator may be used by regularly or irregularlypositioning the Voronoi diagram generator.

In the case where the electric conductive pattern is formed in aboundary form of the figures that form the Voronoi diagram, in order tosolve the visual recognition problem described above, when the Voronoidiagram generator is generated, the regularity and irregularity may beappropriately harmonized. For example, after the area having apredetermined size is set as the basic unit in the area in which thepattern is provided, the dots are generated so that the distribution ofdots in the basic unit has the irregularity, thus manufacturing theVoronoi pattern. If the above method is used, the visuality can becompensated by preventing the localization of the distribution of lineson any one point.

As described above, in the case where the opening ratio of the patternis made constant in the unit area for the uniform conductivity andvisuality of the electrical conductor, it is possible to control thenumber per unit area of the Voronoi diagram generator. In this case,when the number per unit area of the Voronoi diagram generator isuniformly controlled, the unit area is specifically 5 cm² or less andmore specifically 1 cm² or less. The number per unit area of the Voronoidiagram generator is specifically 25 to 2,500/cm² and more specifically100 to 2,000/cm².

Among the figures that form the pattern in the unit area, at least onehas specifically the different shape from the remaining figures.

According to another exemplary embodiment of the present invention, theelectric conductive pattern may be a boundary form of the figures thatare formed of at least one triangle forming the Delaunay pattern. Indetail, the form of the electric conductive pattern is a boundary formof the triangles that form the Delaunay pattern, a boundary form of atleast two triangles that form the Delaunay pattern, or a combined formthereof.

The side effects due to diffraction and interference of light may beminimized by forming the electric conductive pattern in the boundaryform of the figures that are formed of at least one triangle that formsthe Delaunay pattern.

The Delaunay pattern is a pattern that is formed by disposing theDelaunay pattern generator dots in the area in which the pattern will befilled and drawing a triangle by connecting three dots therearound sothat when the circumcircle that includes all corners of the triangle isdrawn, there is no other dot in the circumcircle. In order to form thepattern, Delaunay triangulation and circulation may be repeated on thebasis of the Delaunay pattern generator. The Delaunay triangulation maybe performed in such a way that a thin triangle is avoided by maximizingthe minimum angle of all angles of the triangle. The concept of theDelaunay pattern was proposed by Boris Delaunay in 1934. An example offorming the Delaunay pattern is shown in FIG. 7. In addition, an exampleof the Delaunay pattern is shown in FIG. 11 to FIG. 13. However, thescope of the present invention is not limited thereto.

The pattern of the boundary form of the figures that are formed of atleast one triangle that forms the Delaunay pattern may use the patternthat is derived from the generator by regularly or irregularlypositioning the Delaunay pattern generator. In the exemplary embodimentof the present invention, in the case where the electric conductivepattern is formed by using the Delaunay pattern generator, there is amerit in that a complex pattern form that can prevent the Moirephenomenon can be easily determined.

Even in the case where the electric conductive pattern is formed in aboundary form of the figures that are formed of at least one trianglethat forms the Delaunay pattern, as described above, in order to solvethe visual recognition problem and local conductivity problem, when theDelaunay pattern generator is generated, the regularity and irregularitymay be appropriately harmonized. For example, an irregular and uniformstandard dot is first generated in the area in which the pattern isprovided. In this case, the irregularity means that the distancesbetween the dots are not constant, and the uniformity means that thenumber of dots that are included per unit area is the same as eachother.

An example of the method for generating the irregular and uniformstandard dots will be exemplified below. As shown in FIG. 14A, apredetermined dot is generated on the entire area. After that, theinterval between the generated dots is measured, and in the case wherethe interval between the dots is smaller than the value that ispreviously set, the dots are removed. In addition, the Delaunay trianglepattern is formed on the basis of the dots, and in the case where thearea of the triangle is larger than the value that is previously set,the dots are added in the triangle. The above process is performedrepeatedly, and as a result, as shown in FIG. 14B, the irregular anduniform standard dots are generated. Next, the Delaunay triangle thatincludes one generated standard dot is generated. This step may beperformed by using the Delaunay pattern. If the above method is used,the visuality can be compensated by preventing the localization of thedistribution of lines on any one point.

As described above, in the case where the opening ratio of the patternis made constant in the unit area for the uniform conductivity andvisuality of the electrical conductor, the number per unit area of theDelaunay pattern generator may be controlled. In this case, when thenumber per unit area of the Delaunay pattern generator is uniformlycontrolled, the unit area is specifically 5 cm² or less and morespecifically 1 cm² or less. The number per unit area of the Delaunaypattern generator is specifically 25 to 2,500/cm² and more specifically100 to 2,000/cm².

Among the figures that form the pattern in the unit area, at least onehas specifically the different shape from the remaining figures.

In the exemplary embodiment of the present invention, in the case wherethe electric conductive pattern described above is formed on thetransparent substrate by using the method to be described below, theline width and line height may be made uniform. According to anexemplary embodiment of the present invention, at least a portion of theelectric conductive pattern may be artificially formed to be differentfrom the remaining pattern. The desired electric conductive pattern maybe obtained by this configuration.

For example, in the case where it is required that the electricconductivity of a portion of the area is higher than that of theremaining area according to the purpose, or in the case of the touchpanel electrode, the touch recognition of a portion of the area is moresensitively required, the electric conductive patterns of thecorresponding area and the remaining area may be different from eachother. The line widths and line intervals of the printing pattern may bedifferent from each other so that at least a portion of the electricconductive pattern is different from the remaining printing pattern. Asan example thereof, in the case of the capacitance touch screen, whethera portion that is connected to the pad at the side thereof has highconductivity or not has been considered as a big issue.

According to the exemplary embodiment of the present invention, theelectrical conductor may include an area in which the electricconductive pattern is not formed.

In order to maximize the Moire phenomenon prevention effect, theelectric conductive pattern may be formed so that the area of thepattern that is formed of the figures having the asymmetric structure islarger than the entire pattern area by 10% or more. In addition, theelectric conductive pattern may be formed so that the area of thefigures in which at least one of the lines that connect the centralpoint of any one figure that forms the Voronoi diagram and the centralpoint of the adjacent figure forming the boundary in conjunction withthe figure is different from the remaining lines in views of length islarger than the entire electric conductive pattern area by 10% or more.

When the electric conductive pattern is manufactured, after the patternis designed in a limited area, the method in which the limited area isrepeatedly connected is used to manufacture a large area pattern. Inorder to repeatedly connect the patterns, the repeating patterns may beconnected to each other by fixing the positions of the dots of eachquadrilateral. In this case, the limited area has the area ofspecifically 1 cm² or more and more specifically 10 cm² or more in orderto prevent the Moire phenomenon by the regularity.

The Moire phenomenon may be avoided by the pattern, but the Moirephenomenon may be maximally avoided by controlling the line width andpitch of the conductive pattern. In detail, the fine Moire phenomenonmay be prevented by including the fine line width of 100 micrometers orless, specifically 0.1 to 30 micrometers, more specifically 0.5 to 10micrometers, and even more specifically 1 to 5 micrometers in theconductive pattern. In addition, by allowing the pitch of the conductivepattern not to be identical with the size unit of the pixel of thedisplay, for example, in the case of the display that has the subpixelof 250 micrometers in a long axis direction, the distortion phenomenonof the color of the display due to the pixel interference may beprevented by avoiding that the pitch interval of the conductive patternis set to 250 pitches. The Moire phenomenon according to the line widthand pitch is shown in FIG. 27. As a result of evaluating the Moirephenomenon according to the change in the line width and pitch of 10micrometers or less, in the case of 1.3 micrometers, it can be confirmedthat the occurrence of the fine Moire phenomenon is removed. Inaddition, in the case of the 250 pitches, a rainbow light is observed.From this, the correlation with the long axis length of the pixel of thedisplay such as LCD can be confirmed.

In the exemplary embodiment of the present invention, after the desiredpattern form is determined first, the precise electric conductivepattern that has the thin line width may be formed on the transparentsubstrate by using a printing method, a photolithography method, aphotography method, a method using a mask, a sputtering method, or aninkjet method. When the pattern form is determined, the Voronoi diagramgenerator may be used, such that a complex pattern form may be easilydetermined. Herein, the Voronoi diagram generator means the dots thatare disposed so that the Voronoi diagram can be formed as describedabove. However, the scope of the present invention is not limitedthereto, and other methods may be used when the desired pattern form isdetermined.

The printing method may be performed by using a method in which thepaste that includes the electric conductive pattern material istransferred on the transparent substrate in the desired pattern form andthen sintered. The transferring method is not particularly limited, butthe above pattern form is formed on the pattern transferring medium suchas an intaglio printing plate or a screen and the desired pattern may betransferred on the transparent board by using the pattern form. Themethod for forming the pattern form on the pattern transferring mediummay be performed by using the method that is known in the art.

The printing method is not particularly limited, and a printing methodsuch as offset printing, screen printing, gravure printing, flexoprinting, and inkjet printing may be used, and among them, one or morecomplex method may be used. The printing method may use a roll to rollmethod, a roll to plate method, a plate to roll method or a plate toplate method.

The offset printing may be performed by using the method in which afterthe paste is filled in the intaglio printing plate on which the patternis formed, first transferring is performed by using silicon rubber thatis called the blanket, and the second transferring is performed byclosely contacting the blanket and the transparent board. The screenprinting may be performed by using the method in which after the pasteis disposed on the screen on which the pattern is formed, the paste isdirectly provided on the board through the screen that has the emptyspace while the squeeze is pushed. The gravure printing may be performedby using the method in which after the paste is filled in the patternwhile the blanket where the pattern is formed on the roll is wound, thepaste is transferred on the transparent board. In the exemplaryembodiment of the present invention, the above methods may be used andthe above methods may be used in combination. In addition, otherprinting methods that are known to the person with ordinary skill in theart may be used.

In the case of the offset printing method, because of the releaseproperty of the blanket, since most of the paste is transferred on thetransparent board such as glass, a separate blanket washing process isnot required. The intaglio printing plate may be manufactured byprecisely etching the glass on which the desired electric conductivepattern is formed, and metal or DLC (diamond-like carbon) coating may beperformed on the glass surface for durability. The intaglio printingplate may be manufactured by etching the metal plate.

In the exemplary embodiment of the present invention, in order toimplement the more precise electric conductive pattern, it is preferableto use the offset printing method. FIG. 4 illustrates the offsetprinting method. According to FIG. 2, after the paste is filled in thepattern of the intaglio printing plate by using the doctor blade as thefirst step, the first transferring is performed by rotating the blanket,and as the second step, the second transferring is performed on thesurface of the transparent substrate by rotating the blanket.

In the exemplary embodiment of the present invention, the printingmethod is not limited to the above printing method, and thephotolithography process may be used. For example, the photolithographyprocess may be performed by using the method in which the electricconductive pattern material layer is formed on the entire surface of thetransparent substrate, the photoresist layer is formed thereon. Thephotoresist layer is patterned by the selective exposure and developingprocesses, the electric conductive pattern is patterned by using thepatterned photoresist layer as the mask, and the photoresist layer isremoved.

The present invention may also use the photography method. For example,after the picture photosensitive material that includes silver halide iscoated on the transparent substrate, the pattern may be formed byselectively exposing and developing the photosensitive material. Adetailed example will be described below.

First, the photosensitive material for negative is coated on thesubstrate on which the pattern will be formed. In this case, as thesubstrate, a polymer film such as PET, acetyl celluloid and the like maybe used. Herein, the polymer film material on which the photosensitivematerial is coated is called the film. The photosensitive material fornegative may be formed of silver halide in which AgBr that is verysensitive to and regularly reacted with light and a small amount of AgIare mixed with each other. Since the image that is developed byphotographing the general photosensitive material for negative is anegative picture that is opposite to the subject in terms of light andshade, the photographing may be performed by using the mask that has thepattern form that will be formed and specifically an irregular patternform.

In order to increase the conductivity of the electric conductive patternthat is formed by using the photolithography and photography processes,a plating treatment may be further performed. The plating may use anelectroless plating method, copper or nickel may be used as the platingmaterial, and after the copper plating is performed, nickel plating maybe performed thereon, but the scope of the present invention is notlimited thereto.

The present invention may also use the method using the mask. Forexample, the patterning may be performed by depositing the electricconductive pattern material on the substrate after the mask that has thedesired conductive pattern form is disposed to be close to thesubstrate. In this case, the depositing method may use a heat depositionmethod by heat or electron beam, a PVD (physical vapor deposition)method such as sputter, or a CVD (chemical vapor deposition) methodusing an organometal material.

In the exemplary embodiment of the present invention, the transparentsubstrate is not particularly limited, but the substrate where the lightpermeability is 50% or more may be used and specifically 75% or more. Indetail, glass may be used as the transparent substrate, and the plasticsubstrate or plastic film may be used. As the plastic substrate or film,a material that is known in the art may be used, and for example, amaterial that is formed of one or more resins that are selected frompolyacryls, polyurethanes, polyesters, polyepoxys, polyolefines,polycarbonates, and celluloses may be used. In more detail, the filmhaving the visible ray permeability of 80% or more such as PET(Polyethylene terephthalate), PVB (polyvinylbutyral), PEN (polyethylenenaphthalate), PES (polyethersulfon), PC (polycarbonate), and acetylcelluloid may be used. The thickness of the plastic film is specifically12.5 to 500 micrometers, more specifically 50 to 450 micrometers, andeven more specifically 50 to 250 micrometers. The plastic substrate maybe a substrate that has a structure in which various functional layerssuch as a gas barrier layer for blocking moisture and gas on one side orboth sides of the plastic film and a hard coat layer for compensatingstrength are layered. The functional layer that can be included in theplastic substrate is not limited thereto, and various functional layersmay be provided.

The electric conductive pattern may be directly formed on parts that areincluded in elements or devices such as displays to which the electricalconductor of the present invention may be applied, for example, thesubstrate.

In the exemplary embodiment of the present invention, as the material ofthe electric conductive pattern, the metal that has excellent electricconductivity may be used. In addition, the specific resistance value ofthe electric conductive pattern material may be in the range of 1 microOhm cm to 200 micro Ohm cm. As a detailed example of the electricconductive pattern material, copper, silver, gold, iron, nickel,aluminum, carbon nanotube (CNT), or the like may be used, and silver maybe used. The electric conductive pattern material may be used in aparticle form. In the exemplary embodiment of the present invention, asthe electric conductive pattern material, copper particles that arecoated with silver may also be used.

In the exemplary embodiment of the present invention, in the case wherethe paste that includes the electric conductive pattern material isused, the paste may further include an organic binder in addition to theelectric conductive pattern material described above so as to easilyperform the printing process. The organic binder may have a volatileproperty in the sintering process. The organic binder includes apolyacryl-based resin, a polyurethane-based resin, a polyester-basedresin, a polyolefin-based resin, a polycarbonate-based resin, acellulose resin, a polyimide-based resin, a polyethylenenaphthalate-based resin, and a denatured epoxy, but is not limitedthereto.

In order to improve the attachment ability of the paste to thetransparent substrate such as glass, the paste may further include aglass frit. The glass frit may be selected from the commercial products,but the environmentally friendly glass frit without lead component maybe used. In this case, the average diameter of the used glass frit maybe 2 micrometers or less and the maximum diameter thereof may be 50micrometers or less.

If necessary, a solvent may be further added to the paste. The solventincludes butyl carbitol acetate, carbitol acetate, cyclohexanon,cellosolve acetate, terpineol, etc., but is not limited thereto.

In the exemplary embodiment of the present invention, in the case wherethe paste that includes the electric conductive pattern material,organic binder, glass frit, and solvent is used, the weight ratio of theelectric conductive pattern may be 50 to 90%, the weight ratio of theorganic binder may be 1 to 20%, the weight ratio of the glass frit maybe 0.1 to 10%, and the weight ratio of the solvent may be 1 to 20%.

According to the exemplary embodiment of the present invention, theelectric conductive pattern may be blackened. If the paste that includesthe metal material is sintered at the high temperature, metal gloss isshown, such that the visibility may be deteriorated due to thereflection of light. The problem may be prevented by blackening theelectric conductive pattern. In order to blacken the electric conductivepattern, the blackening material may be added to the paste for formingthe electric conductive pattern or the blackening treatment may beperformed after the paste is printed and sintered, thereby blackeningthe electric conductive pattern.

The blackening material that may be added to the paste includes metaloxide, carbon black, carbon nanotube, black pigment, or colored glassfrit. In this case, the composition of the paste may include 50 to 90 wt% of the electric conductive pattern material, 1 to 20 wt % of theorganic binder, 1 to 10 wt % of the blackening material, 0.1 to 10 wt %of the glass frit, and 1 to 20 wt % of the solvent.

When the blackening treatment is performed after the sintering, thecomposition of the paste may include 50 to 90 wt % of the electricconductive pattern material, 1 to 20 wt % of the organic binder, 0.1 to10 wt % of the glass frit, and 1 to 20 wt % of the solvent. Theblackening treatment after the sintering includes dipping into theoxidized solution, for example, a solution that includes the Fe or Cuion, dipping into the solution that includes halogen ions such as achlorine ion, dipping into hydrogen peroxide and nitric acids, andtreatment using the halogen gas.

According to the exemplary embodiment of the present invention,manufacturing may be performed by dispersing the conductive patternmaterial, organic binder, and glass frit in the solvent. In detail, theorganic binder resin solution is manufactured by dissolving the organicbinder in the solvent, the glass frit is added thereto, the above metalpowder as the conductive material is added thereto, the solution iskneaded, and the metal powder and the glass frit that are agglomeratedare uniformly dispersed by using the three stage roll mill. However, thepresent invention is not limited to the above method.

The line width of the electric conductive pattern described above may be100 micrometers or less, specifically 30 micrometers or less, and morespecifically 25 micrometers or less.

In the exemplary embodiment of the present invention, in the case wherethe above paste is used, if the paste is sintered after being printed inthe above pattern, the pattern that has the electric conductivity isformed. In this case, the sintering temperature is not particularlylimited, but may be 400 to 800° C. and specifically 600 to 700° C. Inthe case where the transparent substrate that forms the electricconductive pattern is glass, if necessary, in the above sintering step,the glass may be shaped for the purpose. In addition, in the case wherethe plastic substrate or film is used as the transparent substrate thatforms the electric conductive pattern, the sintering may be performed ata relatively low temperature. For example, the sintering may beperformed at 50 to 350° C.

The line width of the electric conductive pattern of the electricalconductor is 100 micrometers or less, specifically 30 micrometers orless, more specifically 25 micrometers or less and specifically 5micrometers or more. The interval between the lines of the electricconductive pattern is specifically 30 mm or less, more specifically 10micrometers to 10 mm, more specifically 50 micrometers to 1000micrometers, and more specifically 200 micrometers to 650 micrometers.The height of the electric conductive pattern is 1 to 100 micrometersand more specifically 3 micrometers. The line width and line height ofthe electric conductive pattern may be made uniform by the abovemethods. In the exemplary embodiment of the present invention, theuniformity of the electric conductive pattern may be in the range of ±3micrometers in the case of the line width and in the range of ±1micrometer in the case of the line height.

The electrical conductor according to the exemplary embodiment of thepresent invention may be connected to power, and in this case, theresistance value per unit area in consideration of the opening ratio is0.01 ohm/square to 1000 ohm/square and specifically 0.05 ohm/square to500 ohm/square at normal temperature.

The electrical conductor according to the exemplary embodiment of thepresent invention may be limited to the use of conducting the current byan external factor in addition to the configuration of the electricalconductor itself. In this case, the amount of flowing average current is1 A or less on the basis per 1 min. As an example thereof, in the casewhere the electrical conductor according to the exemplary embodiment ofthe present invention is used as the electromagnetic wave shield (EMI)film, a current flow is generated in the electrical conductor byoccurrence of an electromagnetic wave in a display such as PDP, and thegenerated current is removed through a ground portion. As anotherexample thereof, in the case where the electrical conductor according tothe exemplary embodiment of the present invention is used as oneelectrode layer of the touch panel, a current flow is generated by apotential difference between the electrical conductor according to theexemplary embodiment of the present invention and the oppositeconductive substrate and a contact. As another example thereof, in thecase where the electrical conductor according to the exemplaryembodiment of the present invention is used as the auxiliary electrodefor an organic light emitting diode (OLED) lighting, a current flowsaccording to the potential of the corresponding electrode that is formedon the electrical conductor.

In the electrical conductor according to the exemplary embodiment of thepresent invention, the opening ratio of the electric conductive pattern,that is, the area ratio of the transparent substrate that is not coveredwith the pattern may be 70% or more.

The electrical conductor according to the exemplary embodiment of thepresent invention may be used for the purpose of requiring the electricconductivity. For example, the electrical conductor may be used in theelectromagnetic wave shield film, touch panel, and a light emittingdiode auxiliary electrode. The light emitting diode auxiliary electrodemay be an auxiliary electrode for an organic light emitting diode (OLED)lighting.

According to the exemplary embodiment of the present invention, thereare provided an electromagnetic wave shield film that includes the aboveelectrical conductor of the present invention and a display device thatincludes the same. The electromagnetic wave shield film may furtherinclude a ground portion that is connected to the electric conductivepattern described above. For example, the ground portion may be formedat the edge portion of the surface on which the electric conductivepattern of the transparent substrate is formed. In addition, at leastone of the reflection prevention film, near IR shield film, and colorcompensation film may be provided on at least one side of theelectromagnetic wave shield film. According to the design specification,in addition to the above functional films, other kinds of functionalfilms may be further included. The electromagnetic wave shield film maybe applied to display devices such as a plasma display panel (PDP), aliquid crystal display (LCD), and a cathode-ray tube (CRT).

For example, the plasma display panel may include two panels; and apixel pattern that is disposed between the two panels. Theelectromagnetic wave shield film may be attached to one side of theplasma display panel. In addition, the electric conductive pattern ofthe electromagnetic wave shield film may be provided in such a form thatthe pattern is directly printed on one side of the plasma display panel.In this case, the substrate of the electromagnetic wave shield filmcorresponds to the plasma display panel.

In the case where the substrate of the electromagnetic wave shield filmaccording to the exemplary embodiment of the present invention isattached to the support substrate or device, the substrate may beattached by using the adhesive film. Here, any material that has anadhesive strength and is transparent after attaching may be used as thematerial of the adhesive film. For example, the PVB film, EVA film, PUfilm and the like may be used, but the material of the adhesive film isnot limited thereto. The adhesive film is not particularly limited, butthe thickness thereof may be in the range of 100 micrometers to 800micrometers.

According to another exemplary embodiment of the present invention,there is provided the touch panel that includes the electrical conductorof the present invention. The touch panel according to the exemplaryembodiment of the present invention may include a lower substrate; anupper substrate; and an electrode layer that is provided on at least oneside of a side that is contacted with the upper substrate of the lowersubstrate and a side that is contacted with the lower substrate of theupper substrate or both sides. The electrode layer may perform the Xaxis and Y axis position detection function.

In this case, one or two of the electrode layer that is provided on theside of the upper substrate that is contacted with the lower substrateand the electrode layer that is provided on the side of the lowersubstrate that is contacted with the upper substrate may be theelectrical conductor according to the exemplary embodiment of thepresent invention.

In the case where any one of the electrode layers is the electricalconductor according to the exemplary embodiment of the presentinvention, the other one may have the pattern that is known in the art.

In the case where all of the electrode layers are the electricalconductors according to the exemplary embodiment of the presentinvention, an insulation layer or a spacer may be provided between thelower substrate and the upper substrate so that the interval between theelectrode layers is constantly maintained and the connection is notformed. The insulation layer may be an adhesive agent or a hot meltresin. The electrode may be connected to an external circuit.

According to another exemplary embodiment of the present invention,there are provided an auxiliary electrode for an organic light emittingdiode (OLED) lighting that includes the electrical conductor accordingto the exemplary embodiment of the present invention and the organiclight emitting diode lighting that includes the same. As an examplethereof, the organic light emitting diode lighting according to theexemplary embodiment of the present invention includes a firstelectrode, an auxiliary electrode that is disposed on the firstelectrode, an insulation layer that is disposed on the auxiliaryelectrode, an organic material layer of at least one layer, and a secondelectrode, and the auxiliary electrode is the electrical conductoraccording to the exemplary embodiment of the present invention. Theauxiliary electrode may be directly formed on the first electrode, andthe electrical conductor that includes the transparent substrate and theelectric conductive pattern may be disposed on the first electrode. Theauxiliary electrode of the organic light emitting diode lightingaccording to the exemplary embodiment of the present invention is shownin FIGS. 25 and 26.

MODE FOR INVENTION

Hereinafter, the present invention will be exemplified through Examples.However, the following Examples are set forth to illustrate the presentinvention, but the scope of the present invention is not limitedthereto.

EXAMPLE Example 1

The silver paste was manufactured by dissolving 80 wt % of silverparticles that had the particle diameter of 2 micrometers, 5 wt % ofpolyester resin, and 5 wt % of grass frit in 10 wt % of the BCA (butylcarbitol acetate) solvent. As the intaglio printing plate, the glassthat had the width of 20 micrometers, the depth of 7.5 micrometers, andthe average interval between lines of 600 micrometers and the samepattern as FIG. 1 was used. In this case, when the straight line thatcrossed the formed pattern was drawn, the ratio (distance distributionratio) of standard deviation in respect to an average value of distancesbetween adjacent intersection points of the straight line and thepattern was about 30%.

After the silver pattern was formed on the glass substrate by using themethod shown in FIG. 4 and the offset printer, the silver pattern wassintered at 600° C. for 3 min to form the pattern shown in FIG. 1.

The surface resistance of the glass substrate was 0.6 ohm/square. Thesurface resistance was measured at 9 positions on the glass substrateten times, respectively. As a result, the distribution curve shown inFIG. 17 was confirmed, and in this case, the surface resistance valueand distribution curve are the same as those that are shown in FIG. 17.In this case, the standard deviation was 0.018.

The 40-inch PDP was manufactured by using the glass substrate, and theMoire phenomenon thereof was observed. As a result, on the basis of theline that was vertical in respect to the surface of the PDP, no Moirepattern between 0 and 80° was observed. In addition, even when the glasssubstrate was rotated in respect to the PDP pixel between 0° and 45°,the Moire pattern was not observed.

FIG. 19 illustrates the result of observing the Moire phenomenon foreach angle (O: observation, X: no observation) in the case where theknown pattern that is illustrated in FIG. 15 (line width of 30micrometers, interval between lines of 300 micrometers) and theelectrical conductor that had the irregular pattern manufactured inExample 1 were used, respectively.

Example 2

The silver paste was manufactured by dissolving 80 wt % of silverparticles that had the particle diameter of 2 micrometers, 5 wt % ofpolyester resin, and 5 wt % of grass frit in 10 wt % of the BCA (butylcarbitol acetate) solvent. As the intaglio printing plate, the glassthat had the width of 20 micrometers, the depth of 7.5 micrometers andthe same pattern as FIG. 6 was used.

After the silver pattern was formed on the glass substrate (100 mm×100mm) by using the method shown in FIG. 3 and the offset printer, thesilver pattern was sintered at 600° C. for about 3 min to form thepattern shown in FIG. 6. In this case, when the straight line thatcrossed the formed pattern was drawn, the ratio (distance distributionratio) of standard deviation in respect to an average value of distancesbetween adjacent intersection points of the straight line and thepattern was about 50%.

The 40-inch PDP was manufactured by using the glass substrate, and theMoire phenomenon thereof was observed. As a result, on the basis of theline that was vertical in respect to the surface of the PDP, no Moirepattern between 0° and 80° was observed. In addition, even when theglass substrate was rotated in respect to the PDP pixel between 0° and45°, the Moire pattern was not observed. The surface resistance and theMoire phenomenon observation were the same as those of FIGS. 17 and 19.

Comparative Example 1

The grid pattern on the basis of the square of 0.09 mm² wasmanufactured, and the figure of the pattern was the same as that of FIG.15. In this case, when the straight line that crossed the formed patternwas drawn, the ratio (distance distribution ratio) of standard deviationin respect to an average value of distances between adjacentintersection points of the straight line and the pattern was about 0%.

The 40-inch PDP was manufactured by using the glass substrate, the Moirephenomenon thereof was observed, and the results are shown in FIG. 19(middle column, O: observation, X: no observation).

Comparative Example 2

The same pattern as that of FIG. 16 was manufactured (pitch 0.3 mm). Inthis case, when the straight line that crossed the formed pattern wasdrawn, the ratio (distance distribution ratio) of standard deviation inrespect to an average value of distances between adjacent intersectionpoints of the straight line and the pattern was about 0%.

The 40-inch PDP was manufactured by using the glass substrate, and theMoire phenomenon thereof was observed. As a result, on the basis of theline that was vertical in respect to the surface of the PDP, the Moirepattern was observed with the exception of 45°, 90°, and 225°.

Example 3

The photosensitive material for negative was coated on the PET filmsubstrate on which the pattern will be formed. The photosensitivematerial for negative was formed of silver halide in which AgBr that wasvery sensitive to and regularly reacted with light and a small amount ofAgI were mixed with each other. The irregular pattern that was formed onthe PET film substrate was the same as the pattern of Example 1. Byusing the negative mask that was configured so that light penetrates thedesigned pattern area and light does not penetrate an area other thanthe pattern, light was irradiated to the film according to the setexposure time and intensity of light. By this process, photosensitivesilver on the photosensitive emulsion layer was photosensitized to forma latent image. Photosensitive silver was converted into blackenedsilver through the development process of the formed latent image, suchthat the reverse image pattern of the mask pattern was formed in avisible phase. The properties of the pattern that was made of blackenedsilver formed on the PET film substrate through the photograph processwere shown in Table 1.

TABLE 1 Line width Line height (micrometer) (micrometer) Permeability(%) 20 6.5 75.6

The film was laminated on the glass by using the adhesive film.

The 40-inch PDP was manufactured by using the glass substrate, and theMoire phenomenon thereof was observed. As a result, on the basis of theline that was vertical in respect to the surface of the PDP, no Moirepattern between 0° and 80° was observed. In addition, even when theglass substrate was rotated in respect to the PDP pixel between 0° and45°, the Moire pattern was not observed.

Example 4

The silver paste was manufactured by dissolving 80 wt % of silverparticles that had the particle diameter of 2 micrometers, 5 wt % ofpolyester resin, and 5 wt % of grass frit in 10 wt % of the BCA (butylcarbitol acetate) solvent. As the intaglio printing plate, the glassthat had the width of 20 micrometers, the depth of 7.5 micrometers, andthe Voronoi pattern was used. The Voronoi pattern was generated bysetting the square of 0.09 mm² as the basic unit and providingirregularity to the distribution of dots in the basic unit, and then theVoronoi pattern that was the same as that of FIG. 3 was manufactured.The ratio of the area distribution of the closed figure of the patternwas 23%.

After the silver pattern was formed on the glass substrate by using themethod shown in FIG. 4 and the offset printer, the silver pattern wassintered at 600° C. for 3 min to form the silver line shown in FIG. 3.

The surface resistance of the glass substrate was 0.6 ohms/square. Thesurface resistance was measured at 9 positions on the glass substrateten times, respectively, and as a result, the distribution curve shownin FIG. 18 was confirmed, and in this case, the surface resistance valueand distribution curve are the same as those that are shown in FIG. 18.In this case, the standard deviation was 0.018.

The 40-inch PDP was manufactured by using the glass substrate, and theMoire phenomenon thereof was observed. As a result, on the basis of theline that was vertical in respect to the surface of the PDP, no Moirepattern between 0° and 80° was observed. In addition, even when theglass substrate was rotated in respect to the PDP pixel between 0° and45°, the Moire pattern was not observed.

FIG. 20 illustrates the result of observing the Moire phenomenon foreach angle (O: observation, X: no observation) in the case where theknown pattern that is illustrated in FIG. 15 (line width of 30micrometers, interval between lines of 300 micrometers) and theelectrical conductor that had the irregular pattern manufactured inExample 4 were used, respectively.

Example 5

After the conductive pattern that was manufactured by using the methodof Example 4 was grounded, when the conductive pattern was used as theelectromagnetic wave shield filter of the 40-inch PDP, the EMI levelthat was emitted from the distance of 3 m was measured, and the resultswere shown in FIG. 21.

Example 6

After the touch screen that had the same shape as that of FIG. 22 wasmanufactured by using the pattern that was manufactured by using themethod of Example 4, the linearity evaluation was performed by using thetouch screen. The results were the same as those of FIG. 23. In thiscase, the linearity error of the known touch screen on the basis of ITOwas 2 pixels, whereas it was confirmed that the linearity error of thetouch screen using the electrical conductor on the basis of printingmanufactured by using the method of Example 4, was 1 pixel or less.

Example 7

The blackening treatment was performed by using the pattern that wasmanufactured by using the method of Example 4. In detail, the blackeningtreatment was performed by dipping the manufactured conductive patternsubstrate in 1% of the FeCl₃ (Kanto Chemical Co. Ltd., 16019-02) aqueoussolution at normal temperature for 1 min.

It was confirmed that the reflectivity of Ag can be largely improved byblackening treatment so that there is no problem in terms of visibility.The picture that illustrates the reflectivity before and after theblackening was shown in FIG. 24.

What is claimed is:
 1. An electrical conductor comprising: a transparentsubstrate; and an electric conductive pattern on at least one side ofthe transparent substrate, when a straight line that crosses theelectric conductive pattern is drawn, wherein 30% or more of the entirearea of the transparent substrate has the electric conductive pattern inwhich a ratio (distance distribution ratio) of standard deviation inrespects to an average value of distances between adjacent intersectionpoints of the straight line and the electric conductive pattern is 2% ormore, wherein in the electrical conductor, the opening ratio is 70% ormore.
 2. The electrical conductor according to claim 1, wherein thestraight line that crosses the electric conductive pattern is a line inwhich the standard deviation of the distances between adjacentintersection points of the straight line and the electric conductivepattern is the smallest value.
 3. The electrical conductor according toclaim 1, wherein the straight line that crosses the electric conductivepattern is a straight line that vertically extends in respects to thetangent line of any one point of the electric conductive pattern.
 4. Theelectrical conductor according to claim 1, wherein the straight linethat crosses the electric conductive pattern has 80 or more intersectionpoints with the electric conductive pattern.
 5. The electrical conductoraccording to claim 1, wherein the ratio (distance distribution ratio) ofstandard deviation in respects to the average value of distances betweenadjacent intersection points of the straight line that crosses theelectric conductive pattern and the electric conductive pattern is 20%or more.
 6. The electrical conductor according to claim 1, wherein theelectric conductive pattern has a boundary type pattern of figures thatform a Voronoi diagram.
 7. The electrical conductor according to claim1, wherein in the electric conductive pattern, a line width is 100micrometers or less, an interval between lines is 30 mm or less, and aheight of the line from the surface of the transparent substrate is inthe range of 1 to 100 micrometers.
 8. The electrical conductor accordingto claim 1, wherein the permeability deviation in respects to apredetermined circle that has a diameter of 20 cm is 5% or less.
 9. Theelectrical conductor according to claim 1, wherein the transparentsubstrate is glass, plastic substrate or plastic film.
 10. Theelectrical conductor according to claim 1, wherein in the electricalconductor, the resistance value per unit area is in the range of 0.01ohm/square to 1000 ohm/square at normal temperature.
 11. The electricalconductor according to claim 1, wherein the electrical conductor isconfigured so that a current is conducted by an external factor.
 12. Theelectrical conductor according to claim 1, wherein the average currentis 1 A or less on the basis of 1 min.
 13. The electrical conductoraccording to claim 1, wherein the electric conductive pattern isblackened.
 14. An electromagnetic wave shield film comprising theelectrical conductor according to claim
 1. 15. The electromagnetic waveshield film according to claim 14, further comprising a ground portionthat is provided at an edge portion of a side on which the electricconductive pattern of the transparent substrate is provided.
 16. A touchpanel comprising the electrical conductor according to claim
 1. 17. Thetouch panel according to claim 16, wherein the touch panel includes: alower substrate; an upper substrate; and an electrode layer that isprovided on at least one side of a side of the lower substrate that iscontacted with the upper substrate and a side of the upper substratethat is contacted with the lower substrate, wherein one or two of theelectrode layer that is provided on the side of the lower substrate thatis contacted with the upper substrate and the electrode layer that isprovided on the side of the upper substrate that is contacted with thelower substrate is the electrical conductor.
 18. An organic lightemitting diode lighting comprising the electrical conductor according toclaim 1 as an auxiliary electrode.
 19. A production method for anelectrical conductor, the production method comprising: forming anelectric conductive pattern on a transparent substrate, when a straightline that crosses the electric conductive pattern is drawn, wherein 30%or more of the entire area of the transparent substrate has the electricconductive pattern in which a ratio (distance distribution ratio) ofstandard deviation in respects to an average value of distances betweenadjacent intersection points of the straight line and the electricconductive pattern is 2% or more, wherein in the electrical conductor,the opening ratio is 70% or more.
 20. The production method for anelectrical conductor according to claim 19, wherein the electricconductive pattern is formed by using a printing method, aphotolithography method, a photography method, a method using a mask, asputtering method, or an inkjet method.
 21. The production method for anelectrical conductor according to claim 19, further comprising beforethe electric conductive pattern is formed on the transparent substrate,determining the electric conductive pattern by using a Voronoi diagramgenerator.
 22. The production method for an electrical conductoraccording to claim 19, wherein in the electric conductive pattern, aline width is 100 micrometers or less, an interval between lines is 30mm or less, and a height of the line from the surface of the transparentsubstrate is in the range of 1 to 100 micrometers.
 23. An electricalconductor comprising: a transparent substrate; and an electricconductive pattern that is provided on at least one side of thetransparent substrate, wherein 30% or more of the entire area of thetransparent substrate is formed of closed figures in which distributionsare continuous, and the electrical conductor has the electric conductivepattern in which a ratio (area distribution ratio) of standard deviationin respects to an average value of areas of the closed figures is 2% ormore, wherein in the electrical conductor, the opening ratio is 70% ormore.
 24. The electrical conductor according to claim 23, wherein 30% ormore of the entire area of the transparent substrate is formed of closedfigures in which distributions are continuous, and the electricalconductor has the electric conductive pattern in which a ratio (areadistribution ratio) of standard deviation in respects to an averagevalue of areas of the closed figures is 20% or more.
 25. The electricalconductor according to claim 23, wherein there are at least 100 closedfigures.
 26. The electrical conductor according to claim 23, wherein theelectric conductive pattern has a boundary type pattern of figures thatform a Voronoi diagram.
 27. The electrical conductor according to claim23, wherein the electric conductive pattern has a boundary type patternof figures that are formed of at least one triangle that forms aDelaunay pattern.
 28. The electrical conductor according to claim 23,wherein in the electric conductive pattern, a line width is 100micrometers or less, an interval between lines is 30 mm or less, and aheight of the line from the surface of the transparent substrate is inthe range of 1 to 100 micrometers.
 29. The electrical conductoraccording to claim 23, wherein the permeability deviation in respects toa predetermined circle that has a diameter of 20 cm is 5% or less. 30.The electrical conductor according to claim 23, wherein the transparentsubstrate is glass, plastic substrate or plastic film.
 31. Theelectrical conductor according to claim 23, wherein in the electricalconductor, the resistance value per unit area is in the range of 0.01ohm/square to 1000 ohm/square at normal temperature.
 32. The electricalconductor according to claim 23, wherein the electrical conductor isconfigured so that a current is conducted by an external factor.
 33. Theelectrical conductor according to claim 23, wherein the average currentis 1 A or less on the basis of 1 min.
 34. The electrical conductoraccording to claim 23, wherein the electric conductive pattern isblackened.
 35. An electromagnetic wave shield film comprising theelectrical conductor according to claim
 23. 36. The electromagnetic waveshield film according to claim 35, further comprising a ground portionthat is provided at an edge portion of a side on which the electricconductive pattern of the transparent substrate is provided.
 37. A touchpanel comprising the electrical conductor according to claim
 23. 38. Thetouch panel according to claim 37, wherein the touch panel includes: alower substrate; an upper substrate; and an electrode layer that isprovided on at least one side of a side of the lower substrate that iscontacted with the upper substrate and a side of the upper substratethat is contacted with the lower substrate, wherein one or two of theelectrode layer that is provided on the side of the lower substrate thatis contacted with the upper substrate and the electrode layer that isprovided on the side of the upper substrate that is contacted with thelower substrate is the electrical conductor.
 39. An organic lightemitting diode lighting comprising the electrical conductor according toclaim 23 as an auxiliary electrode.
 40. A production method for anelectrical conductor, the production method comprising: forming anelectric conductive pattern on a transparent substrate, wherein 30% ormore of the entire area of the transparent substrate is formed of closedfigures in which distributions are continuous, and the electricalconductor has the electric conductive patter in which a ratio (areadistribution ration) of standard deviation in respects to an averagevalue of areas of the closed figures is 2% or more, and wherein in theelectrical conductor, the opening ratio is 70% or more.
 41. Theproduction method for an electrical conductor according to claim 40,wherein the electric conductive pattern is formed by using a printingmethod, a photolithography method, a photography method, a method usinga mask, a sputtering method, or an inkjet method.
 42. The productionmethod for an electrical conductor according to claim 40, furthercomprising before the electric conductive pattern is formed on thetransparent substrate, determining the electric conductive pattern byusing a Voronoi diagram generator or a Delaunay pattern generator. 43.The production method for an electrical conductor according to claim 40,wherein in the electric conductive pattern, a line width is 100micrometers or less, an interval between lines is 30 mm or less, and aheight of the line from the surface of the transparent substrate is inthe range of 1 to 100 micrometers.